Lecture, four hours; discussion, one hour; outside study, seven hours. Examination of physics behind majority of modern thin film deposition technologies based on vapor phase transport. Basic vacuum technology and gas kinetics. Deposition methods used in high-technology applications. Theory and experimental details of physical vapor deposition (PVD), chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition processes. Letter grading.

Review Summary

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Enrollment Progress

Mar 11, 3 PM PST
LEC 1: 25/30 seats taken (Open)
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Section List

  • LEC 1

    Open (7 seats)

    TR 8am-9:50am

    Boelter Hall 4760

Course

Instructor
Ya-Hong Xie
Previously taught
23S 21S 19W 18W 17W 16W 15W 14W 13W 11W 10W 09S 08W 05S 04S 02S 00F 99F

Previous Grades

A+AA-B+BB-C+CC-D+DD-F0%20%40%