Lecture, four hours; discussion, one hour; outside study, seven hours. Examination of physics behind majority of modern thin film deposition technologies based on vapor phase transport. Basic vacuum technology and gas kinetics. Deposition methods used in high-technology applications. Theory and experimental details of physical vapor deposition (PVD), chemical vapor deposition (CVD), plasma-enhanced chemical vapor deposition processes. Letter grading.

Review Summary

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Enrollment Progress

Mar 11, 3 PM PST
LEC 80: 14/35 seats taken (Open)
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Section List

  • LEC 80

    Open (15 seats)

    Not scheduled ---

    Online - Asynchronous

Course

Previously taught
23S

Previous Grades

Grade distributions not available.