Lecture, four hours; outside study, eight hours. Enforced requisite: course 115C. Challenges of digital circuit design and layout in deeply scaled technologies, with focus on design-manufacturing interactions. Summary of large-scale digital design flow; basic manufacturing flow; lithographic patterning, resolution enhancement, and mask preparation; yield and variation modeling; circuit reliability and aging issues; design rules and their origins; layout design for manufacturing; test structures and process control; circuit and architecture methods for variability mitigation. Letter grading.

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Enrollment Progress

Jan 17, 11 PM PST
LEC 80: 13/35 seats taken (Open)
Week 1Week 21 day4 days7 days10 days02040

Section List

  • LEC 80

    Open (22 seats)

    Not scheduled ---

    Online - Asynchronous

Course

Previously taught
25W
Formerly offered as
EL ENGR 201D

Previous Grades

Grade distributions not available.