Lecture, four hours; outside study, eight hours. Enforced requisite: course 115C. Challenges of digital circuit design and layout in deeply scaled technologies, with focus on design-manufacturing interactions. Summary of large-scale digital design flow; basic manufacturing flow; lithographic patterning, resolution enhancement, and mask preparation; yield and variation modeling; circuit reliability and aging issues; design rules and their origins; layout design for manufacturing; test structures and process control; circuit and architecture methods for variability mitigation. Letter grading.

Review Summary

Clarity
N/A
Organization
N/A
Time
N/A
Overall
N/A

Enrollment Progress

Dec 4, 3 PM PST
LEC 80: 9/35 seats taken (Open)
First passPriority passSecond pass2 days5 days8 days11 days14 days17 days20 days23 days26 days02040

Course

Previously taught
22W
Formerly offered as
EL ENGR 201D

Previous Grades

Grade distributions not available.